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Spectel was formed in 1990 as a research and development company for advancing the state of technology in semiconductor instrumentation and fabrication. The company's mission is to improve accuracy, physical understanding and stability for metrology through software products. It focuses on computer simulation of optical and SEM imaging instruments used in semiconductor manufacturing and their application in metrology.

Products

Software Products

  • Measure - measure semiconductor features using SEM and optical images off-line
  • Metrologia - a collection of simulation and analysis programs written for metrologists, IC manufacturing process engineers and semiconductor equipment designers
  • Technical papers
Applications

Applications include:

Optical and electron beam metrology
Offline Measurement
Microscope image simulation of patterned wafers and photomasks
Stepper Alignment target modelling
Diffraction grating simulation
Images of diffraction gratings in microscopes
scatterometry
inverse scattering
automatic measurement
MEMS metrology
Optical Design
Resist edge roughness analysis
SEM sharpness analysis
Film Stack Modeling and Simulation

Application Notes

Services
  • Software Customization
  • Consulting on optical and SEM applications
Products in Development

Inverse Scattering Module - enables the user to determine side wall angles and other 3-dimensional features from top-down SEM images.

For additional information such as technical papers, product presentations and user downloads, connect to Spectel's FTP site. Some files will require Acrobat Reader to view.

 

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Contact us at: metrology at spectelresearch dot com

Innovation in Semiconductor Metrology
 Spectel Research Corporation
Palo Alto, CA
USA